Modeling and extraction of residual stresses in some MEMS multilayer systems
Feed: Random News Portal | 2026-09-02 20:05
Modeling and extraction of residual stresses in some MEMS multilayer systems
Li Long, Frank Long, Bernhard Schwartz, Geert Brokmann, and Thomas Ortlepp
J. Sens. Sens. Syst., 15, 167–175, https://doi.org/10.5194/jsss-15-167-2026, 2026
Thin-film multilayers deposited on a wafer induce bending due to residual and thermal stresses that strongly depend on process conditions. The resulting curvature can be measured optically. We present a closed-form analytical model that relates the measured curvature to the residual stresses in individual layers. Using a small set of curvature measurements, layer-resolved residual stresses can be extracted without resource-intensive finite-element model simulations.
